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L_JP2_INSTPARAM

Summary

The L_JP2_INSTPARAM structure provides information for an instruction's parameters.

Syntax

typedef struct _tagL_JP2_INSTPARAM 
{ 
   L_UINT32 uStructSize; 
   L_UINT32 uXo; 
   L_UINT32 uYo; 
   L_UINT32 uWidth; 
   L_UINT32 uHeight; 
   L_UINT8  uPersist; 
   L_UINT32 uLife; 
   L_UINT32 uNextUse; 
   L_UINT32 uXc; 
   L_UINT32 uYc; 
   L_UINT32 uWc; 
   L_UINT32 uHc; 
} L_JP2_INSTPARAM,   *pL_JP2_INSTPARAM;

Members

uStructSize

Size of this structure, in bytes. Use the sizeof operator to calculate this value.

uXo

Horizontal offset. This field specifies the horizontal location at which the top left corner of the compositing layer being acted on by this instruction shall be placed in the render area, in samples.

uYo

Vertical offset. This field specifies the vertical location at which the top left corner of the compositing layer being acted on by this instruction shall be placed in the render area, in samples.

uWidth

Width of the current compositing layer. This field specifies the width on the render area.

uHeight

Height of the current compositing layer. This field specifies the height on the render area.

uPersist

Persistence. This field specifies whether, before the execution of the next instruction: (a) the samples rendered to the display as a result of the execution of the current instruction will persist on the display background, or (b) if the display background will be reset to its last previous state before the execution of the current instruction.

uLife

Duration of this instruction. This field specifies the number of timer ticks that should ideally occur between completing execution of the current instruction and completing execution of the next instruction. A value of zero indicates that the current instruction and the next instruction will be executed within the same display update.

uNextUse

Number of instruction before reuse. This field specifies the number of instructions that shall be executed before reusing the current compositing layer.

uXc

Horizontal crop offset. This field specifies the horizontal distance in samples to the left edge of the desired portion of the current compositing layer.